APA

Geynts Y. E., Minin I. V. & Minin O. V.Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes. : .

Chicago

Geynts Yu E, Minin I V and Minin O V.Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes. : .

Harvard

Geynts Y. E., Minin I. V. and Minin O. V.Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes. : .

MLA

Geynts Yu E, Minin I V and Minin O V.: . .