Talbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes / Yu. E. Geynts, I. V. Minin, O. V. Minin

Уровень набора: Optics and Laser TechnologyОсновной Автор-лицо: Geynts, Yu. E., Yury ElmarovichАльтернативный автор-лицо: Minin, I. V., physicist, Professor of Tomsk Polytechnic University, Doctor of technical sciences, 1960-, Igor Vladilenovich;Minin, O. V., physicist, professor of Tomsk Polytechnic University, Doctor of technical sciences, 1960-, Oleg VladilenovichКоллективный автор (вторичный): Национальный исследовательский Томский политехнический университет, Инженерная школа неразрушающего контроля и безопасности, Отделение электронной инженерииЯзык: английский.Страна: .Резюме или реферат: Conventional projection Talbot lithography usually employs opaque (amplitude) or transparent (phase) masks for creating a periodic array of Fresnel diffraction fringes in the photosensitive substrate. For particular mask design the longitudinal periodicity of Talbot carpet can be avoided producing quasi uniform striped pattern (Talbot stripes). We propose a novel hybrid amplitude-phase mask which is engineered for obtaining extremely smooth Talbot stripes and simultaneously high lateral optical contrast and extreme spatial resolution better than a third of laser wavelength. By means of the numerical simulations, we demonstrate the robustness of produced striped diffraction patterns against mask design deviation and light incidence angle variations. The reproducibility of the Talbot stripes is reported also for 1D and 2D metal-dielectric projection masks..Примечания о наличии в документе библиографии/указателя: [References: 32 tit.].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | Talbot lithography | wavelength-scaled diffraction grating | optical contrast | projection mask | литография | дифракционные решетки | масштабирование | оптический контраст | фотолитография | полосы Тальбота Ресурсы он-лайн:Щелкните здесь для доступа в онлайн
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[References: 32 tit.]

Conventional projection Talbot lithography usually employs opaque (amplitude) or transparent (phase) masks for creating a periodic array of Fresnel diffraction fringes in the photosensitive substrate. For particular mask design the longitudinal periodicity of Talbot carpet can be avoided producing quasi uniform striped pattern (Talbot stripes). We propose a novel hybrid amplitude-phase mask which is engineered for obtaining extremely smooth Talbot stripes and simultaneously high lateral optical contrast and extreme spatial resolution better than a third of laser wavelength. By means of the numerical simulations, we demonstrate the robustness of produced striped diffraction patterns against mask design deviation and light incidence angle variations. The reproducibility of the Talbot stripes is reported also for 1D and 2D metal-dielectric projection masks.

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